M07100 - SEMI M71 - CMOS LSI用シリコン・オン・インシュレーター（SOI）ウェーハのための仕様 Lang-English Such impurities may be introduced

Such impurities may be introduced into the wafer during manufacture or during various processing steps

150 mm flatted polished single crystal silicon wafers with secondary flat

SEMI F48-0200 (first published)

of fiducial notches on silicon wafers fall within specified limits

2 mm) Diameter Polished Monocrystalline Indium Phosphide Wafers

M07100 - SEMI M71 - CMOS LSI用シリコン・オン・インシュレーター（SOI）ウェーハのための仕様 Lang-English Such impurities may be introducedglobal Silicon Wafer Committee2010120global Audits and Reviews Subcommittee20102www. semi. org200711 CMOSLSI large scale integrated circuitSOI silicon on insulator130nm65nm45nmLSI200mm300mm150mmLSI Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M35 Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated