S02500 - SEMI S25 - Safety Guideline for Hydrogen Peroxide Storage & Handling Systems Lang-Chinese (Simplified) supported by the EtherCAT Technology

supported by the EtherCAT Technology Group (ETG)

The decomposition of silicon oxide on silicon wafer

12-89 (technical revision)

This Guide contains definitions of terms and procedures for determining the leak rates of MFCs as used in the semiconductor industry

The purpose of this Document is to define the basic interface dimensions of a load port on the semiconductor manufacturing equipment

S02500 - SEMI S25 - Safety Guideline for Hydrogen Peroxide Storage & Handling Systems Lang-Chinese (Simplified) supported by the EtherCAT TechnologyThe purpose of this Safety Guideline is to set out the minimum safety and health criteria to be applied to equipment and systems for storage and handling of hydrogen peroxide in the semiconductor and flat panel display industries. This Safety Guideline addresses concentrations of hydrogen peroxide (H2O2) commonly used in the semiconductor and FPD industries (i. e., concentrations below 40% w w). This Safety Guideline is focused on the storage,