D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdTpc-Mask and Mask Equipment Even for polysilicon gates

Even for polysilicon gates

本試験方法は，一辺の長さが125ｍｍ以上で，厚さが100μm 以上の正方形および擬似正方形の太陽電池シリコンセルを対象とする。

interface trapped charge

SEMI MF26-0305 (Reapproved 0211)

Customary units are in parentheses for reference purposes only and may have been rounded to the nearest whole value

D08400 - SEMI D84 - Terminology for FPD Phase Shift Mask and Mask Blanks StdTpc-Mask and Mask Equipment Even for polysilicon gatesThis Standard defines the terminology for FPD phase shift masks and mask blanks. This Standard applies to phase shift masks and mask blanks that are principally used in fabricating flat panel displays. Referenced SEMI Standards (purchase separately) None. Revision History SEMI D84 0823 (first published)