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For organizations without such procedures
This Guide will address the various metrology techniques that are currently available that enable TSV dimensional measurements
SEMI M41-0701 (technical revision)
NOTE 1: For determination of shallow and other defect densities in wafer production environments
SEMI MF43 — Test Method for Resistivity of Semiconductor Materials
MF072800 - SEMI MF728 - Practice for Preparing an Optical Microscope for Dimensional Measurements Revision:SEMI MF728-1106 (Reapproved 0622) - Current For organizations without such proceduresDimensional measurements made with an optical microscope are made on the optical image of the specimen and not directly on the specimen itself. The method of illuminating the specimen affects the image content, including the appearance of edges which are used in defining the size of the specimen. This Practice includes adjusting the microscope for Kohler illumination, which provides uniform illumination of the specimen, reduces stray light, and
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